Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target

Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties.

High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target.

High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality of materials.

High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed.

Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target.
Excellent electrical properties: Reliable atmosphere sintering enables stable electrical conductivity of oxides with semiconductor characteristics.

* Maximum sizes of planar target    

Thickness: 30mm (can be 60mm for round target)    

Width: max 2000mm    

Length: max 4000mm    

* Maximum sizes of rotary target    

Vacuum/Air Spraying    

Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm    

Backing tubes: ID78~83 x OD89~92 x Length300~3000mm, Thickness: 3~7mm    

Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm    

Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm    

Bonding    

Backing tubes: ID125 x OD133 x Length500~4000mm, Thickness: 8~13mm    

* Planar/Rotary target can be customised as per your request.

ACETRON is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.